JPH0346545B2 - - Google Patents

Info

Publication number
JPH0346545B2
JPH0346545B2 JP58174774A JP17477483A JPH0346545B2 JP H0346545 B2 JPH0346545 B2 JP H0346545B2 JP 58174774 A JP58174774 A JP 58174774A JP 17477483 A JP17477483 A JP 17477483A JP H0346545 B2 JPH0346545 B2 JP H0346545B2
Authority
JP
Japan
Prior art keywords
base body
mandrel
particles
substrate
particle flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58174774A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067663A (ja
Inventor
Yasuo Morohoshi
Akira Nishiwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17477483A priority Critical patent/JPS6067663A/ja
Priority to US06/649,858 priority patent/US4601922A/en
Priority to DE19843434433 priority patent/DE3434433A1/de
Publication of JPS6067663A publication Critical patent/JPS6067663A/ja
Publication of JPH0346545B2 publication Critical patent/JPH0346545B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP17477483A 1983-09-21 1983-09-21 薄膜形成装置 Granted JPS6067663A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17477483A JPS6067663A (ja) 1983-09-21 1983-09-21 薄膜形成装置
US06/649,858 US4601922A (en) 1983-09-21 1984-09-12 Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes
DE19843434433 DE3434433A1 (de) 1983-09-21 1984-09-19 Verfahren und vorrichtung zum erzeugen einer duennen schicht auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17477483A JPS6067663A (ja) 1983-09-21 1983-09-21 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS6067663A JPS6067663A (ja) 1985-04-18
JPH0346545B2 true JPH0346545B2 (en]) 1991-07-16

Family

ID=15984429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17477483A Granted JPS6067663A (ja) 1983-09-21 1983-09-21 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS6067663A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2410080A1 (en) 2010-07-20 2012-01-25 Japan Super Quartz Corporation Vitreous silica crucible and method of manufacturing silicon ingot

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495812B (en) * 2000-03-06 2002-07-21 Semiconductor Energy Lab Thin film forming device, method of forming a thin film, and self-light-emitting device
JP6879209B2 (ja) * 2016-08-29 2021-06-02 東レ株式会社 積層体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884970A (ja) * 1981-11-12 1983-05-21 Matsushita Electric Ind Co Ltd 真空メツキ装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2410080A1 (en) 2010-07-20 2012-01-25 Japan Super Quartz Corporation Vitreous silica crucible and method of manufacturing silicon ingot

Also Published As

Publication number Publication date
JPS6067663A (ja) 1985-04-18

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